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We are looking for a variable angle spectroscopic ellipsometer that can replace our current ellipsometer. We have a large range of applications for this instrument.
Among other things we need to be able to determine the thickness of very thin silicon oxides and other oxides from e.g. ALD. We need to be able to make automatic wafer maps of thickness and refractive index of transparent and semitransparent films for quality control purposes.
We also need to be able to determine refractive index of various materials like plastic films, determine thickness and refractive index of thin absorbing films and we need to be able to determine optical parameters for materials for optical purposes in the IR wavelength range (at least up to 1690 nm, preferable higher).
We also need to be able to determine layer thickness and refractive index on patterned wafers on as small patterns as possible (laterally), at least down to 500-700 µm patterns (length scale). The equipment must produce accurate and reproducible results. Furthermore, we also need measurement- and analyzing time to be very short, even for wafer mapping with several incident angles over the whole wavelength range.
The instrument will be placed in a multi–user environment so it must be very user friendly and robust