Lyhyt kuvaus
The objects of the tender process are three (3) vertical Low pressure chemical vapor deposition (LPCVD) batch furnaces (later ‘LPCVD TEOS’, ‘LPCVD nitride’, ‘LPCVD polysilicon’ or ‘equipment’). The main processes the equipment will be used for, are depositions of TEOS silicon dioxides, low stress silicon nitride and polysilicon. The procurement is described in detail in the invitation to tender documents.