Eesmärk
DTU Danchip is buying a Maskless Aligner, MLA 150 similar to the one bought in 2017. In 2017 DTU Danchip acquired a MLA 100 maskless aligner from Heidelberg Instruments Mikro-technik GmbH, which is being used for photolithography. Traditionally, a pattern in micro and nanofabrication, has been produced by shining UV light through a chromium mask with a chromium pattern, thereby creating a “shado image” on a silicon wafer with a thin photosensitive film (photo-resist). Contrary to this method, maskless aligners are writing the pattern directly on the wafer by means of a guided laser beam, thus eliminating the need for a shadow mask. This technique is especially advantageous in research and development projects, where frequent design changes often necessitate many new masks. A significant cost saving is thereby achieved, since a single mask easily can cost 350 EUR. Time is also saved, since it typically takes a week to receive a new mask.