Eesmärk
National Cyber Crime Center, Norway will procure a FIB/SEM Dualbeam for material analysis and semiconductor works, including circuit edit. The system must have state of the art electron (SEM) and Ga ion (FIB) column. The SEM column must include in-column SE and BSE detectors, and in-chamber SE and BSE detectors. A EDS detector for elemental analysis must also be included. The FIB must have a SE and a secondary Ion detector.
The instrument must have a gas delivery system for both single and multiple gases. Precursors must be available for all deposition and enhanced etching techniques necessary for advanced circuit edit on modern semiconductor processes, including etching of Cu and low-k dielectrics.
The system must have various ways of navigating in silicon including software for overlaying GDS and microscope images, in-chamber camera for point and click navigation, and in-chamber microscope with IR illumination capable of imaging through silicon.