Supply of a Hybrid Physical Chemical Vapour Deposition Machine using a Reactive Pulsed Magnetron Sputtering Process

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Pavadinimas Supply of a Hybrid Physical Chemical Vapour Deposition Machine using a Reactive Pulsed Magnetron Sputtering Process
Trumpas pirkimo aprašymas CERN intends to place a Contract for the supply, installation, testing and commissioning of one hybrid physical chemical vapour deposition (HPCVD) machine using a reactive pulsed magnetron sputtering deposition process (hereinafter referred to, in whole or in part, as the “Supply”), as defined in this Technical Description, including its annexes and in accordance with the criteria defined in the Qualification Questionnaire.

Pasiūlymų pateikimo terminas 2021-07-07 23:59

Perkančioji organizacija CERN, 108967751




Nuoroda į šaltinį https://cds.cern.ch/record/2772177?ln=en

Nuoroda į dokumentus
MS-4697_Technical_Description.pdf
MS-4697_Cover_Letter.pdf
MS-4697_Qualification_Questionnaire.pdf
MS-4697_Qualification_Questionnaire.docx

id-p354LT55030882274_P354